Controlled thin film vapor generator for liquid volume reduction
US10350508B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2015 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Mar 26, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02A20/124
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A reactor comprising a plurality of vessels, each having a heat exchange surface for processing a fluid as a thin film flow, the vessels arranged in a concentric manner; a plurality of annular spaces situated between the vessels; and a pathway for directing a heat exchange fluid from one vessel to an adjacent vessel for creating a temperature differential between the heat exchange surfaces and the fluid being processed. A system comprising a fluid source, a reactor, and a vapor outlet and a processed fluid outlet through generated vapor and processed fluid are directed out of the reactor, respectively. A method comprising providing a plurality of concentrically arranged surfaces in spaced relation, distributing a fluid to be processed against the surfaces in a controlled manner to form a substantially uniform thin film flow thereon, and evaporating at least a portion of the fluid being processed along the plurality of surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.