Low pressure drop static mixing system
US10350545B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 24, 2015 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | May 10, 2037 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF23J2219/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A contaminated gas stream can be passed through an in-line mixing device, positioned in a duct containing the contaminated gas stream, to form a turbulent contaminated gas stream. One or more of the following is true: (a) a width of the in-line mixing device is no more than about 75% of a width of the duct at the position of the in-line mixing device; (b) a height of the in-line mixing device is no more than about 75% of a height of the duct at the position of the in-line mixing device; and (c) a cross-sectional area of the mixing device normal to a direction of gas flow is no more than about 75% of a cross-sectional area of the duct at the position of the in-line mixing device. An additive can be introduced into the contaminated gas stream to cause the removal of the contaminant by a particulate control device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.