Polysiloxane films and methods of making polysiloxane films
US10351729B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Mar 3, 2016 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Aug 21, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/095
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A polysiloxane film comprises Si—O bonds and has a thickness of 0.3 to 1.5 microns. Adjacent electrodes coated with the polysiloxane film have a leakage current of at most 0.01 mA at 10 V after contact with water. An electrode coated with the polysiloxane film has a contact resistance of at least 0.01 ohms at 1.0 mm of pogo pin compression under a 1.0 N load. The polysiloxane film provides IPx7 protection from ingress of water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.