Method of diamond nucleation and structure formed thereof
US10351948B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2016 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Apr 14, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02491
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a method of diamond nucleation, comprising the following steps: providing a substrate and forming a graphene layer on a surface of the substrate; providing a reaction chamber and disposing the substrate in the reaction chamber; providing a gas mixture in the reaction chamber, wherein the gas mixture includes a carbon-containing gas; and forming a plasma in the reaction chamber to cause the carbon-containing gas to react and form a plurality of diamond nuclei on a surface of the graphene layer. The present invention also relates to a structure formed by the aforesaid method, comprising: a substrate; a graphene layer disposed on the substrate; and a plurality of diamond particles formed on the graphene layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.