Patent · US Active

Recombinant polymerases with increased phototolerance

US10358634B2 · kind B2 · utility

0Cited by
11References
19Claims
0Family size

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Key dates

Filing dateAug 4, 2017
Grant dateJul 23, 2019
Priority date
Expiry dateJan 4, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/52
  • WIPO fieldBiotechnology
  • WIPO sectorChemistry

Abstract

Provided are compositions comprising recombinant DNA polymerases that include amino acid substitutions, insertions, deletions, and/or exogenous features that confer modified properties upon the polymerase for enhanced single molecule sequencing. Such properties include increased resistance to photodamage, and can also include enhanced metal ion coordination, reduced exonuclease activity, reduced reaction rates at one or more steps of the polymerase kinetic cycle, decreased branching fraction, altered cofactor selectivity, increased yield, increased thermostability, increased accuracy, increased speed, increased readlength, and the like. Also provided are nucleic acids which encode the polymerases with the aforementioned phenotypes, as well as methods of using such polymerases to make a DNA or to sequence a DNA template.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.