Patent · US Active

Apparatus and method for producing anti-glare surfaces

US10364180B2 · kind B2 · utility

2Cited by

4References

19Claims

0Family size

Assignee

CORNING INCORPORATED · US

Inventors

Baifeng Chen · San Jose, US
Haixing Chen · Shanghai, CN
Ling Chen · Roseville, US
Haofei Gong · Shanghai, CN
Jun Hou · Beijing, CN

Key dates

Filing date	Jan 6, 2016
Grant date	Jul 30, 2019
Priority date	—
Expiry date	Jan 21, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C15/00
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

An apparatus for producing anti-glare surfaces includes an etching cream dipping tank and a sub-tank arranged to receive a slurry of etching cream. A pumping unit is fluidly coupled to the etching cream dipping tank and the sub-tank such that the pumping unit is operable to selectively self-circulate the slurry of etching cream in the sub-tank to improve homogeneity of the etching cream and transfer a volume of the homogenized etching cream from the sub-tank to the etching cream dipping tank.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.