Composition and method of producing siliceous film
US10364372B2 · kind B2 · utility
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Key dates
| Filing date | Dec 28, 2017 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Mar 22, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L83/16
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.