Patent · US Active

Method of releasing graphene from substrate

US10369775B2 · kind B2 · utility

1Cited by

5References

17Claims

0Family size

Assignees

IMEC VZW · BE
Katholieke Universiteit Leuven · BE

Inventors

Steven Brems · Kessel-Lo, BE
Cedric Huyghebaert · Heverlee, BE
Ken Verguts · Leuven, BE
Stefan De Gendt · Wijnegem, BE

Key dates

Filing date	Dec 8, 2017
Grant date	Aug 6, 2019
Priority date	—
Expiry date	Dec 8, 2037

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T156/19
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The disclosed technology generally relates to preparing two-dimensional material layers, and more particularly to releasing a graphene layer from a template substrate. According to an aspect, a method of releasing a graphene layer includes providing a template substrate on which the graphene layer is provided, the method comprising: subjecting the graphene layer and the template substrate to a water treatment by soaking the graphene layer and the template substrate in water such that water is intercalated between the template substrate and the graphene layer; and subjecting the graphene layer and the template substrate to a delamination process, thereby releasing the graphene layer from the template substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.