Array substrate and method of manufacturing the same, and display device
US10372000B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 20, 2016 |
| Grant date | Aug 6, 2019 |
| Priority date | — |
| Expiry date | May 20, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/121
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a method of manufacturing an array substrate, the method including a step of forming thin film transistors on a substrate; wherein the step of forming the thin film transistors on the substrate includes: forming a first electrically conductive layer on the substrate; forming an insulating layer on the first electrically conductive layer; forming at least one common holes in the insulating layer to communicate with the first electrically conductive layer; forming a first connection portion, which is made of the same material as a second electrically conductive layer, in the at least one of the at least one common holes while forming the second electrically conductive layer on the insulating layer by using a single process, the first connection portion being in electrical contact with the first electrically conductive layer. In addition, there is disclosed an array substrate manufactured by the above method and a display device including the array substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.