Mask for deposition, method of manufacturing mask, and method of manufacturing display device
US10374157B2 · kind B2 · utility
1Cited by
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28Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 15, 2017 |
| Grant date | Aug 6, 2019 |
| Priority date | — |
| Expiry date | Aug 23, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/164
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask for deposition, a method of manufacturing a mask for deposition, and a method of manufacturing a display device, the mask for deposition being coupleable to a frame with tensile force applied to opposite ends of the mask in a first direction and including a first rib portion having a first thickness; and a pattern portion including a plurality of pattern holes through which a deposition material is transmittable, and at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.