Assessment method, and semiconductor device manufacturing method
US10381274B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2016 |
| Grant date | Aug 13, 2019 |
| Priority date | — |
| Expiry date | Dec 27, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
To easily assess a feedback capacitance of a semiconductor element. An assessment method of assessing a feedback capacitance of a semiconductor element is provided, the assessment method including:acquiring a first characteristic correlated with the feedback capacitance and a second characteristic correlated with the feedback capacitance; andassessing the feedback capacitance based on the first characteristic and the second characteristic. The first characteristic may be a characteristic that corresponds to a withstanding voltage of the semiconductor element, and the second characteristic may be an on-resistance of the semiconductor element. In the assessing, the feedback capacitance may be assessed based on a ratio between the first characteristic and the second characteristic.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.