Apparatus and method for controlling doping
US10381503B2 · kind B2 · utility
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4References
10Claims
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Key dates
| Filing date | Oct 26, 2015 |
| Grant date | Aug 13, 2019 |
| Priority date | — |
| Expiry date | Oct 26, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/112
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method, the apparatus comprising: at least one charged substrate (3); a channel of two dimensional material (5); and at least one floating electrode (7A-C) wherein the floating electrode comprises a first area (10A-C) adjacent the at least one charged substrate, a second area (11A-C) adjacent the channel of two dimensional material and a conductive interconnection (9A-C) between the first area and the second area wherein the first area is larger than the second area and wherein the at least one floating electrode is arranged to control the level of doping within the channel of two dimensional material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.