Electron beam conditioning
US10384299B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2013 |
| Grant date | Aug 20, 2019 |
| Priority date | — |
| Expiry date | Mar 11, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/05
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.