Patent · US Active

Compositions for anti pattern collapse treatment comprising gemini additives

US10385295B2 · kind B2 · utility

0Cited by

2References

16Claims

0Family size

Assignee

BASF SE

Inventors

Andreas Klipp · Lambsheim, DE
Andrei Honciuc · Iași, RO
Guenter Oetter · Bischofswerda, DE
Christian Bittner · Bensheim, DE

Key dates

Filing date	Jul 1, 2013
Grant date	Aug 20, 2019
Priority date	—
Expiry date	Dec 1, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A method of reducing defects of a semiconductor substrate whereby the substrate is rinsed with an aqueous composition containing a gemini additive of the general formula I after the development of a photoresist or a photolithographic mask

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.