Open-loop thermal management process and system
US10386121B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2014 |
| Grant date | Aug 20, 2019 |
| Priority date | — |
| Expiry date | Dec 8, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/14
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
Open-loop thermal management systems and open-loop thermal management processes are disclosed. The process includes providing an open-loop thermal management system, saturating a reactor of the system with gas while a flow control unit prevents flow of the gas from the reactor, and maintaining a gas dissociation pressure range of the gas within the reactor. The system includes the reactor being arranged to receive a heat load. The reactor contains metal hydrides, metal organic framework, or a combination thereof. The reactor includes at least one venting line extending from the reactor. Also, the flow control unit is configured to adjustably control the flow of gas from the reactor to maintain the gas dissociation pressure range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.