Chemical vapour infiltration apparatus having a high loading capacity
US10392696B2 · kind B2 · utility
5Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2013 |
| Grant date | Aug 27, 2019 |
| Priority date | — |
| Expiry date | Jul 14, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An installation for chemical vapor infiltration of porous preforms of three-dimensional shape extending mainly in a longitudinal direction, the installation comprising a reaction chamber of parallelepiped shape, the side walls of the reaction chamber including heater means and a plurality of stacks of loader devices arranged in the reaction chamber. Each loader device being in the form of an enclosure of parallelepiped shape provided with support elements for receiving porous preforms for infiltrating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.