Interferometer measurement device and control method therefor
US10393507B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 28, 2016 |
| Grant date | Aug 27, 2019 |
| Priority date | — |
| Expiry date | Dec 28, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An interferometer measuring device is disclosed which includes a workpiece stage (10), a laser interferometer (20) and a measuring reflector (30) mounted on the workpiece stage. The measuring reflector (30) is comprised of a plurality of planar mirrors (31) that are joined together along a horizontal direction. The laser interferometer (20) includes a first interferometer (21) and a second interferometer (22). The first interferometer (21) and the second interferometer (22) are configured such that during a horizontal movement of the workpiece stage (10) with respect to the laser interferometer (20), when light beams emanated from the first interferometer (21) and the second interferometer (22) are incident on a transition section (32) defined by corresponding adjacent two of the planar mirrors (31), the light beam emanated from the first interferometer (21) is incident on one of the adjacent two planar mirrors (31) and the light beam emanated from the second interferometer (22) is incident on the other of the adjacent two planar mirrors (31). Additionally, the first interferometer (21) and the second interferometer (22) alternately provide positional information to the workpiece s…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.