Method and device for etching patterns inside objects
US10399240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2017 |
| Grant date | Sep 3, 2019 |
| Priority date | — |
| Expiry date | Mar 13, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/172
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Methods and devices for etching patterns on interior surfaces of hollow objects are described. The method may include preparation of the interior surface of the object, such as pre-cleaning, and coating the interior surface of the object. A pattern may then be generated on the interior surface of the object by any of mechanical or manual scribing and peeling, laser ablation, or photoresist coating and laser exposure, development and hardening. The pattern is then etched using chemical etchants, and finished to remove remaining coating, provide surface passivation and/or protectant application. Mechanical and laser devices which may facilitate pattern generation are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.