Patent · US Active

Method for producing purified active silicic acid solution and silica sol

US10400147B2 · kind B2 · utility

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1References
11Claims
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Key dates

Filing dateSep 14, 2012
Grant dateSep 3, 2019
Priority date
Expiry dateNov 22, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K13/04
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.