Patent · US Active

Sequential processing with vapor treatment of thin films of organic-inorganic perovskite materials

US10403836B2 · kind B2 · utility

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2References
23Claims
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Key dates

Filing dateNov 12, 2014
Grant dateSep 3, 2019
Priority date
Expiry dateSep 19, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

According to some embodiments of the present invention, a method of producing an organic-inorganic perovskite thin film includes depositing a layer of inorganic material on a substrate to form an inorganic film, and performing an organic vapor treatment of the inorganic film to produce an organic-inorganic perovskite thin film. The layer of inorganic material comprises an inorganic anion layer having a metal-ligand framework, and the organic vapor treatment provides organic cations capable of becoming inserted into the metal-ligand framework of the inorganic anion layer to form a perovskite structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.