Methods and apparatus for laser cleaning
US10407821B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Jan 8, 2015 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Jan 8, 2035 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06F75/246
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of cleaning a substrate (16, 24, 34, 64, 71, 82, 102, 165, 171, 181, 201, 300, 310) with optical energy can comprise applying optical energy from a source of optical energy (12, 21, 31, 91, 103, 114, 121, 131, 141, 151, 164, 191, 202) to the substrate. The method can comprise applying the optical energy to a substrate having a cleaning agent applied thereto, the optical energy having one or more optical parameters selected for cleaning the substrate. The method can comprise reading data from a data bearing element (173) associated with the substrate, communicating the data to a processor (154) associated with a cleaning appliance (10, 30, 40, 60, 70, 80, 90, 110, 120, 130, 140, 150, 161, 200) comprising the source of optical energy, wherein the processor, responsive to the communicated data, controls the cleaning of the substrate with the optical energy. The method can comprise slidingly contacting the substrate with a work surface, said work surface comprising an aperture (83, 117) and emanating optical energy from the aperture for cleaning the substrate. A cleaning appliance can comprise an appliance body (80, 90, 104, 125) comprising an aperture for emanating optical en…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.