Method and system for adjusting light pattern for structured light imaging
US10408605B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 7, 2015 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Oct 8, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10028
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and a method for producing an adjustable light pattern are provided herein. The system may include: a transmitter configured to illuminate a scene with a patterned light being adjusted based on predefined criteria; a receiver configured to receive reflections of the adjusted patterned light; and a computer processor configured to control the adjustment of the patterned light and further analyze the received reflections, to yield a depth map of objects within the scene, wherein the transmitter may include: a light source configured to produce a light beam; a first reflector tiltable approximately along a line on an x-y plane in a Cartesian x-y-z coordinate system; and a second reflector tiltable along a z-axis in said coordinate system, wherein the reflectors are tilted along their respective axes back and forth so as to divert the light beam for creating the adjusted patterned light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.