System and method for monitoring atomic absorption during a surface modification process
US10408744B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2018 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Aug 16, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/08
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A processing system monitors and/or controls a surface modification process occurring on a substrate within a processing chamber. An optical processing module having a light emission submodule to output a generated light signal and an optical detection submodule to detect a resultant light signal, is connected via fiber optic cables to light illuminating and light receiving components located within the chamber. A processor determines an amount of atomic absorption by an atomic element encountered by a probing beam passing between the illuminating and receiving components, based on the intensity of the generated light signal, the intensity of the received light signal and optionally the spontaneous emission of the atomic element in the absence of illumination by a probing beam. Based on the determined amount, the system derives a plurality of parameters of the modified substrate, their spatial and temporal uniformity, and information about process conditions in the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.