Alignment method
US10409084B2 · kind B2 · utility
1Cited by
2References
20Claims
0Family size
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Key dates
| Filing date | Jun 30, 2017 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Aug 17, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for assessing the relative alignment of a first and second diffractive element. The method includes illuminating the first diffractive element to form a first diffraction pattern in the far field and illuminating the second diffractive element to form a second diffraction pattern in the far field. The method further comprises determining a positional and/or rotational relationship between the first diffraction pattern and the second diffraction pattern in the far field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.