Ways to generate plasma in continuous power mode for low pressure plasma processes
US10410833B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2014 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Dec 29, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3326
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber; exposing said surface to a plasma during a treatment period within said reaction chamber; ensuring a stable plasma ignition by applying a power input, characterized in that the power input is continuously strictly higher than zero Watt (W) during said treatment period and comprises at least a lower limit power and at least an upper limit power strictly larger than said lower limit power, thereby obtaining a substrate with a coated surface. The present invention further concerns an apparatus for treating a substrate with a low-pressure plasma process and a substrate treated as such.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.