Patent · US Active

Processed wafer of scalable electrical circuits, method for making same, and device comprising scaled electrical circuits

US10410975B1 · kind B1 · utility

1Cited by
2References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 4, 2015
Grant dateSep 10, 2019
Priority date
Expiry dateSep 4, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L23/585
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A processed semiconductor wafer has layered elements that define electrical circuits and a double-seal ring surrounding each individual electrical circuit. The layered elements further define another double-seal ring that surrounds at least two electrical circuits. The processed semiconductor wafer can have additional layered elements that extend each of the double-seal rings that surround individual circuits or, that can extend the other double-seal ring. A method of fabricating such a processed semiconductor wafer. A device comprising two such electrical circuits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.