Patent · US Active

Optimization of tunnel location for uniform contact pressure distribution

US10411272B2 · kind B2 · utility

0Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 21, 2016
Grant dateSep 10, 2019
Priority date
Expiry dateJul 18, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/50
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A number of variations may include at least one bipolar plate which may include at least one bead, the bead may include a plurality of crest portions and a plurality of trough portions having at least one tangent portion disposed between adjacent crest portions and trough portions; the bipolar plate further may include at least one tunnel defining at least one through hole within the at least one tangent portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.