Low-reflection coating, low-reflection coated substrate, and photoelectric conversion device
US10416353B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2015 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Jan 23, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A low-reflection coating of the present invention is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound together by the binder. The binder further contains an aluminum compound. The low-reflection coating contains, as components, 55 to 70 mass % of the fine silica particles, 25 to 40 mass % of the silica of the binder, and 2 to 7 mass % of the aluminum compound in terms of Al2O3. The low-reflection coating has a thickness of 80 to 800 nm. The low-reflection coating yields a transmittance gain of 2.5% or more when provided on the substrate. The transmittance gain represents an increase in average transmittance of the substrate provided with the low-reflection coating relative to the substrate not provided with the low-reflection coating, the average transmittance being measured in the wavelength range of 380 to 850 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.