Patent · US Active

Water soluble photosensitive resin composition and film using same

US10423069B2 · kind B2 · utility

0Cited by
2References
20Claims
0Family size

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Key dates

Filing dateAug 30, 2017
Grant dateSep 24, 2019
Priority date
Expiry dateDec 27, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/3452
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.