Virtual mask alignment for fit analysis
US10424113B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2014 |
| Grant date | Sep 24, 2019 |
| Priority date | — |
| Expiry date | Jul 28, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG16B40/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Apparatus and associated methods relate to fitting a virtual mask to a virtual face by first fitting a chin region of the virtual mask to the virtual face, then determining an virtual mask angle that maintains the fitted chin region while simultaneously fitting a nose-bridge region of the virtual mask to the virtual face, and then calculating a fit-quality metric corresponding to the fitted position. In an illustrative embodiment, the fitted chin region may include the high curvature menton region of the chin. In some examples, a virtual mask may be virtually pressed toward the virtual face using a predetermined force corresponding to a force of a mask securing device of a real mask corresponding to the virtual mask In an exemplary embodiment, the fitting of a virtual mask to a virtual face may advantageously yield a mask's fit quality in a brief amount of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.