Patent · US Active

Multiple wafers fabrication technique on large carrier with warpage control stiffener

US10424524B2 · kind B2 · utility

2Cited by
23References
20Claims
0Family size

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Key dates

Filing dateMar 23, 2018
Grant dateSep 24, 2019
Priority date
Expiry dateMar 23, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3511
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a method of manufacturing a semiconductor device that includes adhering a plurality of semiconductor substrates and a framing member to a supporting surface of a carrier substrate. The semiconductor substrates can be wafers that can be diced or cut into a plurality of dies. Thus, the wafers each have respective active surfaces and at least one respective integrated circuit region. The method can further include encapsulating the framing member and the plurality of semiconductor substrates within an encapsulant. Subsequently, the carrier substrate is removed and a redistribution layer (RDL) is formed on the semiconductor substrates and the framing member.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.