Coating film, manufacturing method for same, and PVD device
US10428416B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 17, 2014 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Apr 8, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/5833
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance (defect resistance) and peeling resistance. This coating film coats a substrate surface, wherein a hard carbon layer is formed extending in columns-shape perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6 when the hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.