Tray device, reaction chamber and MOCVD apparatus
US10428424B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 12, 2013 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Nov 18, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68771
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the invention provide a tray device, a reaction chamber, and a MOCVD apparatus including the reaction chamber. According to an embodiment, the tray device includes a large tray, a rotating shaft, a small tray, and a supporting disk. The rotating shaft is connected with the center of the large tray and drives the large tray to rotate about the rotating shaft. The large tray is provided with a tray groove for placing the small tray. The supporting disk is located under the large tray. A sliding mechanism is provided between the supporting disk and the small tray, so that when revolving along with the large tray, the small tray spins under the function of the sliding mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.