Formulation and method for inhibiting carbon-based deposits
US10428429B2 · kind B2 · utility
2Cited by
3References
19Claims
0Family size
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Key dates
| Filing date | Sep 30, 2015 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Sep 30, 2035 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16L58/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
There is a formulation and a method for inhibiting carbon-based deposits on metal substrate. The method comprises the use of a formulation comprising at least one oxidizing agent and at least one etchant capable of forming free metal ions from the metal substrate, at least one sequestering agent having a ligand capable of forming a complex with the free metal ions and at least one chelating agent having a ligand capable of complexing with at least one surface metal atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.