Patent · US Active

Enhancing complex fracture geometry in subterranean formations, sequential fracturing

US10428633B2 · kind B2 · utility

0Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 23, 2015
Grant dateOct 1, 2019
Priority date
Expiry dateSep 23, 2035

Classification

  • Technology area (CPC E)Fixed Constructions
  • CPC primaryE21B47/06
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Methods including introducing a first high-viscosity treatment fluid (HVTF) into a subterranean formation through an opening and applying incrementally increased fracturing rate steps (IIFRSs) to the first HVTF to create or enhance a dominate fracture, wherein between each IIFRS applied to the first HVTF a downhole pressure slope over time will increase, decline, or stabilize at a first HVTF measured pressure slope. Evaluating the first HVTF measured pressure slope prior to applying a subsequent IIFRS to the first HVTF. Introducing a first low-viscosity treatment fluid (LVTF) through the opening to create or enhance a secondary azimuth fracture extending from the dominate fracture, and introducing a low-viscosity diversion fluid pill (LVDF) pill through the opening to create a fluidic seal therein.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.