Light-enhanced self-cleaning film system and method of forming same
US10429641B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2017 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Nov 28, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/0068
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system also includes a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.