Imprint apparatus and method
US10431456B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 12, 2018 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Jan 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136295
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint method includes: applying a applying a material for forming a patterned layer having a pattern, to a substrate; feeding a stamp film including a stamp pattern corresponding to the pattern of the patterned layer, along a pressure roller and an idle roller; forming the patterned layer having the pattern, including: the pressure roller pressing the stamp film toward the material to contact the stamp pattern of the stamp film with the material layer, curing the material layer in contact with the stamp pattern, and moving the pressure roller and the idle roller to peel the stamp film off the cured material layer by a peeling force, to form the patterned layer having the pattern; and detecting a defect in the formed patterned layer, during the peeling of the stamp film, by sensing the peeling force in real time by a pressure sensor connected to the pressure roller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.