Patent · US Active

Fabricating non-uniform diffraction gratings

US10436958B2 · kind B2 · utility

3Cited by
5References
26Claims
0Family size

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Key dates

Filing dateOct 3, 2017
Grant dateOct 8, 2019
Priority date—
Expiry dateOct 28, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31711
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of fabricating non-uniform gratings includes implanting different densities of ions into corresponding areas of a substrate, patterning, e.g., by lithography, a resist layer on the substrate, etching the substrate with the patterned resist layer, and then removing the resist layer from the substrate, leaving the substrate with at least one grating having non-uniform characteristics associated with the different densities of ions implanted in the areas. The method can further include using the substrate having the grating as a mold to fabricate a corresponding grating having corresponding non-uniform characteristics, e.g., by nanoimprint lithography.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.