Patent · US Active

Electrode assembly for a dielectric barrier discharge plasma source and method of manufacturing such an electrode assembly

US10438776B2 · kind B2 · utility

0Cited by
3References
13Claims
0Family size

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Key dates

Filing dateJul 15, 2016
Grant dateOct 8, 2019
Priority date
Expiry dateJul 15, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02W30/82
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An electrode assembly for use in a dielectric barrier discharge plasma source comprises a base metal plate, an enamel layer on a surface of the base metal plate and embedded electrodes embedded in the enamel layer. The electrode assembly may be made by depositing a one or more layers of powdered glass over a surface of the base metal plate, fusing the powdered glass the one or more layers each in a separate heating step for the relevant layer. To form the embedded electrodes, a pattern of electrode material is provided over the powdered glass of the one or more layers after fusing the one or more layers. Subsequently one or more further layers of powdered glass are deposited over the electrodes and the layer(s) below it, and the powdered glass in each of the one or more further layers is fused in a separate heating step.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.