Display substrate and manufacturing method thereof, and display device
US10444579B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 29, 2017 |
| Grant date | Oct 15, 2019 |
| Priority date | — |
| Expiry date | Sep 29, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1368
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A display substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of the display substrate includes: forming an insulation layer on a base substrate, the base substrate including a display area and a peripheral area; and forming a planarization film on the insulation layer; performing a patterning process to the planarization film to form a planarization layer with a first thickness in the display area, a planarization layer with a second thickness in the peripheral area, and a first via hole in the planarization layer with the second thickness, the second thickness being less than the first thickness, and performing an etching process on the peripheral area to thin or remove the planarization layer is with the second thickness, and forming a second via hole corresponding to the first via hole in the insulation layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.