Storage device and photoresist coating and developing machine having storage device
US10446424B2 · kind B2 · utility
1Cited by
0References
15Claims
0Family size
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Key dates
| Filing date | Apr 20, 2017 |
| Grant date | Oct 15, 2019 |
| Priority date | — |
| Expiry date | Apr 20, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
A storage device and a photoresist coating and developing machine having a storage device are disclosed. The storage device includes a frame and a plurality of layers of support plates disposed in sequence in the frame in a height direction of the frame, being used for receiving substrates to be exposed. The frame is provided with a plurality of layers of support members respectively associated with the plurality of layers of support plates, and each layer of the support plates is slidably mounted on the support member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.