Patent · US Active

Two-dimensional layered material quantum well junction devices

US10446705B2 · kind B2 · utility

1Cited by
3References
6Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 30, 2015
Grant dateOct 15, 2019
Priority date
Expiry dateJul 30, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A quantum well device includes a first layer of a first two-dimensional material, a second layer of a second two-dimensional material, and a third layer of a third two-dimensional material disposed between the first layer and second layer. The first layer, the second layer, and the third layer are adhered predominantly by van der Waals force.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.