Two-dimensional layered material quantum well junction devices
US10446705B2 · kind B2 · utility
1Cited by
3References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 30, 2015 |
| Grant date | Oct 15, 2019 |
| Priority date | — |
| Expiry date | Jul 30, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A quantum well device includes a first layer of a first two-dimensional material, a second layer of a second two-dimensional material, and a third layer of a third two-dimensional material disposed between the first layer and second layer. The first layer, the second layer, and the third layer are adhered predominantly by van der Waals force.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.