Radical gas generation system
US10450654B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2014 |
| Grant date | Oct 22, 2019 |
| Priority date | — |
| Expiry date | Aug 24, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a radical gas generation system according to the present invention, a process chamber apparatus includes a table that causes a target object to rotate. A radical gas generator includes a plurality of discharge cells. Each of the plurality of discharge cells includes an opening. The opening is connected to the inside of the process chamber apparatus and faces the target object. Through the opening, a radical gas is output. Of the plurality of discharge cells, a discharge cell located farther from a center position of the rotation of the target object in a plan view includes a larger facing surface area that is a region in which a first electrode member and a second electrode member face each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.