Multicolor photolithography materials and methods
US10459337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2016 |
| Grant date | Oct 29, 2019 |
| Priority date | — |
| Expiry date | Dec 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to photoresist compositions comprising a base resin such as a monomer capable of radical polymerization upon photoinitiation, and photoinitiator molecules such as a diketone, and multicolor photolithography methods. Photoresist compositions comprise photoinitiator molecules that are exposed to a first radiation source, thereby exciting the photoinitiator molecules from a ground state to a pre-activated state. The pre-activated state molecules are then exposed to a second radiation source in selected locations, thereby deactivating the pre-activated state molecules in the selected locations. Any remaining pre-activated state molecules are exposed to a third radiation source, exciting such remaining pre-activated state photoinitiator molecules to an activated state. Polymerization of the base resin is then initiated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.