Process for producing an array of mesa-structured photodiodes

US10461211B2 · kind B2 · utility

Assignee

• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Giacomo BADANO · Le Pont-de-Claix, FR
• Clément Lobre · Grenoble, FR
• Roch Espiau De Lamaestre · Grenoble, FR
• Jean-Paul Chamonal · Meylan, FR

Key dates

• Filing date: Apr 23, 2018
• Grant date: Oct 29, 2019
• Expiry date: May 16, 2038

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50

Abstract

The invention pertains to a process for producing an array (1) of mesa-structured photodiodes (2), including at least the following steps:a) producing a useful layer (3);b) producing an etch mask formed of a plurality of etch pads (20);c) wet-etching part of the useful layer (3) located between the etch pads (20), forming a plurality of mesa-structured photodiodes (2), producing a recess (21);d) conformally depositing a passivation layer (14);e) removing the etch pads (20) by chemical dissolution;f) producing conductive pads (11).