Layout analysis on image
US10467466B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2019 |
| Grant date | Nov 5, 2019 |
| Priority date | — |
| Expiry date | Jun 28, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present application relates to layout analysis on an image. The layout analysis method comprises: obtaining coordinate information of one or more character lines in an image; generating a layout model corresponding to the image by setting character data in regions in a data structure that correspond to the coordinate information of the one or more character lines, the character data including data indicating the presence of character; scanning the generated layout model to read the character data from the layout model, and performing paragraph division on the layout model based on a relative positional relationship of the read character data in the layout model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.