Gas mixer and semiconductor device fabricating apparatuses including the same
US10468234B2 · kind B2 · utility
0Cited by
13References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2016 |
| Grant date | Nov 5, 2019 |
| Priority date | — |
| Expiry date | Dec 12, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32009
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A semiconductor device fabricating apparatus includes a gas mixer having an upper surface and a lower surface, each of the upper and lower surfaces has an elliptical plane, and a side surface connecting the upper and lower surfaces, a gas inlet pipe on an upper portion of the gas mixer, and a gas outlet pipe on a lower portion of the gas mixer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.