Fluid droplet methodology and apparatus for imprint lithography
US10468247B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2016 |
| Grant date | Nov 5, 2019 |
| Priority date | — |
| Expiry date | Feb 8, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a first fluid droplet pattern for the formable material dispensed at a preset minimum pitch or an integer multiple thereof; determining a second fluid droplet pattern based on the first fluid droplet pattern, wherein the second fluid droplet pattern is a non-integer multiple of the preset minimum pitch; determining an adjusted speed of the substrate and the fluid dispense ports relative to each other to generate the second fluid droplet pattern; moving the substrate and the fluid dispense ports relative to each other at the adjusted speed; and dispensing the formable material through the fluid dispense ports at the preset frequency to form the second fluid droplet pattern on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.