Patent · US Active

Bonding wire for semiconductor device

US10468370B2 · kind B2 · utility

1Cited by
7References
7Claims
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Key dates

Filing dateJul 23, 2015
Grant dateNov 5, 2019
Priority date
Expiry dateJul 23, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/35121
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There is provided a bonding wire for a semiconductor device including a coating layer having Pd as a main component on a surface of a Cu alloy core material and a skin alloy layer containing Au and Pd on a surface of the coating layer, the bonding wire further improving 2nd bondability on a Pd-plated lead frame and achieving excellent ball bondability even in a high-humidity heating condition. The bonding wire for a semiconductor device including the coating layer having Pd as a main component on the surface of the Cu alloy core material and the skin alloy layer containing Au and Pd on the surface of the coating layer has a Cu concentration of 1 to 10 at % at an outermost surface thereof and has the core material containing either or both of Pd and Pt in a total amount of 0.1 to 3.0% by mass, thereby achieving improvement in the 2nd bondability and excellent ball bondability in the high-humidity heating condition. Furthermore, a maximum concentration of Au in the skin alloy layer is preferably 15 at % to 75 at %.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.