Plasma source
US10470284B2 · kind B2 · utility
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1References
15Claims
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Assignee
Inventors
Key dates
| Filing date | Mar 15, 2018 |
| Grant date | Nov 5, 2019 |
| Priority date | — |
| Expiry date | Mar 15, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma source is provided. The plasma source includes a chamber body inside which plasma is generated, a first mirror magnet, a second mirror magnet, and a cusp magnet provided around the chamber body and spaced apart in a axial direction thereof, each comprising permanent magnets radially spaced apart from each other to form spaces between adjacent permanent magnets thereof; and a cooling medium flow passage provided in the spaces that passes a cooling medium for cooling the chamber body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.